利用同步辐射XRD研究BiFeO_3外延多铁薄膜的微结构  

The microstructure of epitaxial BiFeO_3 thin films investigated by Synchrotron radiation X-ray diffraction

作　　者：李晓龙[1] 王灿[2] 顾月良[1] 何庆[1] 吕惠宾[2] 金奎娟[2] 周兴泰[1] 徐洪杰[1] 

机构地区：[1]中国科学院上海应用物理研究所,上海201204 [2]中国科学院物理研究所,北京100080

出　　处：《中国科学：物理学、力学、天文学》2011年第1期12-16,共5页Scientia Sinica Physica,Mechanica & Astronomica

基　　金：国家自然科学基金(批准号:10979073;10874226);国家重点基础研究发展计划(编号:2010CB934501)资助项目

摘　　要：使用脉冲激光沉积在SrTiO3衬底上生长了不同厚度的BiFeO3(BFO)薄膜,X射线衍射分析表明薄膜是BFO外延薄膜.X射线反射率测量发现BFO薄膜密度随着厚度的增加而增加,同时薄膜表面存在厚度为数纳米的非设计覆盖层.随着厚度的增加,BFO薄膜由完全应变过渡到应变部分弛豫状态,同时BFO从四方相转变为单斜相.The microstructure of epitaxial BiFeO3 （BFO） thin films with different thickness on SrTiO3 substrates were studied by the Synchrotron radiation X-ray diffraction. It was shown by X-ray reflectivity that the electron density of BFO film increases with thickness; meanwhile, a capped layer of several nm is existed on the surface of the BFO films. With the thickness increasing, we found that the BFO films are changed from fully strain tetragonal phase to partly relaxed monoclinic phase.

关 键 词：铁电薄膜 微结构 同步辐射衍射 

分 类 号：O484.1[理学—固体物理]