软X光激光Sn衰减膜的制备及测量  

FABRICATION AND MEASUREMENTS OF SOFT X RAY ATTENUATION STANNUM FOIL

作　　者：汤学峰[1] 顾牡[1] 吴广明[1] 张力[1] 祁金林[1] 童宏勇[1] 乔轶 陈玲燕[1] 

机构地区：[1]同济大学波耳固体物理研究所,上海200092

出　　处：《原子能科学技术》1999年第4期340-342,共3页Atomic Energy Science and Technology

基　　金：国家"863"强激光技术领域课题;青年激光技术基金

摘　　要：采用磁控溅射方法制备了 Ｓｎ 衰减膜。应用真空α能谱测厚仪和αｓｔｅｐ １００ 台阶仪分别测得 Ｓｎ 衰减膜的质量厚度为４５０．３ μｇ／ｃｍ ２，表面不均匀性＜ ３ ％ 。质量厚度和表面均匀性的测试结果均符合软 Ｘ 光激光实验的要求。利用俄歇电子能谱对 Ｓｎ 膜表面杂质及表面氧化情况并结合 Ａｒ 离子束刻蚀对氧含量深度分布情况进行了分析。分析结果表明： Ｓｎ 膜暴露在空气中而氧化生成一定厚度的氧化层，其主要成分是 Ｓｎ Ｏ２ 和 Ｓｎ２ Ｏ３。The stannum attenuation foil is fabricated by magnetron sputtering. The mass thickness of the stannum attenuation foil measured by a vacuum α energy spectrum mass thickness apparatus is 450.3 μg/cm 2, and the measurement result from α step 100 thickness measurement apparatus shows that the surface nonuniform is less than 3 %. The mass thickness and surface homogeneity of the stannum attenuation foil can meet the request of soft X ray laser experiment. The impurities and surface oxide of the stannum attenuation foil are studied through AES method, and combine with Ar ion beam etching, the depth distribution of oxygen is analyzed. The results indicate that there is an oxide layer on the surface of the stannum attenuation foil exposed in air environment, and the main components of the oxide layer are SnO 2 and Sn 2O 3.

关 键 词：锡衰减膜 质量厚度 表面均匀性 表面氧化 薄膜 

分 类 号：O484.5[理学—固体物理] O484.1[理学—物理]