高功率脉冲磁控溅射氩氮比对ZrN薄膜结构及性能的影响  

Influence of the ratio Ar/N on microstructures and surface properties of ZrN films deposited by HPPMS

作　　者：吴忠振[1] 田修波[1] 段伟赞[1] 巩春志[1] 杨士勤[1] 

机构地区：[1]哈尔滨工业大学现代焊接生产技术国家重点实验室,黑龙江哈尔滨150001

出　　处：《真空》2011年第1期13-17,共5页Vacuum

基　　金：国家自然科学基金(10775036和50773015)

摘　　要：采用高功率复合脉冲磁控溅射的方法(HPPMS)在不锈钢基体上制备ZrN薄膜,对比DCMS方法制备的ZrN薄膜,得出HPPMS制备的薄膜表面更平整光滑、致密,既无空洞、又无大颗粒等缺陷。Ar/N对薄膜相结构及硬度、耐磨耐蚀等有较大影响。XRD结果显示,薄膜主要以ZrN(111)和ZrN(220)晶面择优生长,并呈现出多晶面竞相生长的现象。制备的ZrN薄膜的硬度最高可达33.1 GPa,同时摩擦系数小于0.2,耐腐蚀性也有很大提高,腐蚀电位比基体提高了0.27 V,腐蚀电流下降到未处理工件的1/5。存在一个合适的Ar/N比,使得制备的ZrN薄膜具有较好的耐磨性和耐腐蚀性。ZrN films were deposited by HPPMS（high power pulsed magnetron sputtering） process on the surface of stainless steel parts as substrate.Compared with the ZrN films deposited by DCMS,the surface of the same films by HPPMS is flatter,smoother and void-free without large-size particles found.The influence of the ratio Ar/N on the phase structure,wear ability and corrosion resistance of the films was obvious.XRD patterns showed that the grains of the films grow mainly toward the preferred orientation ZrN（111） and ZrN（220）,and that many crystal planes grow in competition.The films have very high hardness up to 33.1GPa and low friction coefficient less than 0.2.The corrosion resistance is improved that the corrosion potential is increased by 0.27V but the corrosion current is decreased to just 1/5 of the substrate without the film.In the HPPMS process the proper value of the ratio Ar/N makes both the wearability and corrosion resistance of the films higher.

关 键 词：高功率脉冲磁控溅射 氮化锆薄膜 微观结构 表面性能 

分 类 号：TG174.444[金属学及工艺—金属表面处理]