不同过渡层对钢基金刚石薄膜的影响  

Investigation of Diamond Films Deposition on Steel Substrates with Different Interlayers

作　　者：王玲[1] 余志明[1] 魏秋平[1] 田孟昆[1] 王志辉[1] 

机构地区：[1]中南大学材料科学与工程学院,长沙410083

出　　处：《中国表面工程》2011年第1期33-39,共7页China Surface Engineering

基　　金：粉末冶金国家重点实验室开放基金(2008112048);湖南省研究生创新基金(1343–74236000005);中南大学贵重仪器开放共享基金(ZKJ2008001)

摘　　要：采用超高真空热丝化学气相沉积(HFCVD)系统,以甲烷和氢气为反应气体,在高速钢W18Cr4V基体上利用3种不同的过渡层(WC、Cr、WC/Cr)制备金刚石薄膜。采用场发射扫描电子显微镜(FE–SEM)、X射线衍射仪(XRD)、显微激光拉曼光谱仪(Raman)以及洛氏硬度计对过渡层和金刚石薄膜进行检测分析,研究了不同过渡层对金刚石薄膜形貌质量和附着性能的影响。结果表明,3种过渡层均可以有效减少钢基中Fe对金刚石薄膜的负面影响,提高金刚石的形核率;其中,采用WC/Cr过渡层时膜基间残余应力最小,仅为0.25 Gpa,附着性能最好。Diamond films were deposited on high-speed steel（HSS） substrates pre-coated with different interlayers（WC,Cr and WC/Cr）by hot filament chemical vapour deposition（HFCVD）.The surface morphology,film quality and interface structure of the diamond films were characterised by scanning electron microscopy（SEM）,micro-raman spectroscopy and X-ray diffractometry（XRD）,respectively.The adhesion of the diamond films was measured by Rockwell hardness tester.The results show that with the WC,Cr and WC/Cr interlayer,the high quality,low residual stress and high nucleation density of diamond film are achieved on the HSS substrates.As determined from Raman spectra,furthermore,the films with WC/Cr interlayer are under the lowest compressive stress,σ ≤0.25 GPa,showing a best adhesion.

关 键 词：金刚石薄膜 高速钢 过渡层 化学气相沉积 附着性能 

分 类 号：TG174.444[金属学及工艺—金属表面处理]