制备参数对TbFeCo磁光薄膜性能的影响  

Effects of Preparation Parameters on the Optical Constants of TbFeCo/Si

作　　者：张勇[1] 张晋敏[2] 田华[2] 

机构地区：[1]贵州大学科技学院,贵阳550004 [2]贵州大学理学院,贵阳550004

出　　处：《重庆理工大学学报（自然科学）》2011年第1期75-81,共7页Journal of Chongqing University of Technology：Natural Science

基　　金：贵州省贵阳市科技局大学生创业基金资助项目([2007]筑科计合同字第6-2号);贵州省教育厅大学生创业基金资助项目(701059101);贵州省科技厅自然科学基金资助项目(20033059);贵州省教育厅自然科学基金资助项目(2003315)

摘　　要：对采用磁控溅射制备TbFeCo/Si、Ag/TbFeCo/Si系列薄膜的溅射工艺进行了研究,分析了TbFeCo薄膜的生长机理,并对其光学性质、磁性质和磁光性质进行了分析。实验结果表明,不同压强对TbFeCo薄膜的成分比有明显的影响,确定了工作压强为2.0 Pa是适合的,这时制备的薄膜的成分原子比和靶的原子比最接近。用全自动椭圆偏振光谱仪测量了TbFeCo薄膜在1.5~4.5eV的椭偏光谱,结果表明,随着工作气压、溅射功率和Ar气流量的变化,薄膜的光学性质均发生明显变化。对制备的Ag/TbFeCo/Si和TbFeCo/Si磁光薄膜的磁光性质进行了分析,结果表明,Ag保护膜对TbFeCo磁光薄膜的磁光性质会产生显著影响。In this paper,the technology of fabrication of TbFeCo/Si,Ag/TbFeCo/Si films by magnetron sputtering system were thoroughly investigated.First,the growth mechanism,the optical property,the megtronic property and the magnet-optical property of TbFeCo were analyzed.The results showed that different sputtering pressures had different influences on components of TbFeCo film,and it was found that the appropriate pressure was 2.0 pa.Second,the optical properties of the TbFeCo films were investigated in the photon energy range of 1.5-4.5 eV using Spectroscopic Ellipsometry,and the impact of the fabrication on the optical properties of the TbFeCo/Si were analyzed.The results showed that with the change of sputtering pressures,power and Ar flux,the film properties differ significantly.Finally,the megtronic property and the magnet-optical property of Ag/TbFeCo/Si and TbFeCo/Si films were analyzed.The results showed that Ag films have significant impact on the magnet-optical property of TbFeCo.

关 键 词：磁控溅射 TbFeCo薄膜 椭偏光谱 光学常数 

分 类 号：O484.1[理学—固体物理]