暴露空气对臭氧处理ITO表面效果的影响  

The Influence of Atmosphere Exposure after RF Ozone Treatment on ITO Surface

作　　者：连加荣[1] 杨谢危[1] 杜长运[1] 曾鹏举[1] 

机构地区：[1]深圳大学光电子器件与系统(教育部,广东省)重点实验室,广东深圳518060

出　　处：《现代显示》2011年第3期36-39,共4页Advanced Display

基　　金：国家自然科学基金面上项目(编号:20972097);深圳大学科研基金面上项目(编号:000011)

摘　　要：文章研究了暴露空气对臭氧处理ITO表面效果的影响。结果表明,臭氧处理ITO表面显著提高了器件的空穴注入能力,暴露空气减弱了臭氧处理对空穴注入的提高效果。研究显示,暴露空气对臭氧处理效果的影响在于:不仅减小ITO表面功函数,导致空穴注入势垒重新增大,也将降低ITO表面能,减弱空穴注入层的粘附力,增加阳极界面接触电阻。Here the influence of atmosphere exposure after RF Ozone treatment on ITO surface has been studied.The results indicated that： Ozone treatment on ITO surface improved hole injection sharply,but the atmosphere exposure after treatment decreased this improvement.We proposed that the atmosphere exposure not only decreased the work function of treated ITO surface that increased hole injection barrier again,but also decreased ITO surface energy that reduced the strength of adhesion and increased the contact resistant at anode interface.

关 键 词：有机发光 空穴注入 臭氧处理 暴露空气 

分 类 号：O432[机械工程—光学工程]