高精度转台速度稳定性研究  

The Speed Stability for the High Precision Turntable

作　　者：杜璧秀[1] 张淑梅[1] 高慧斌[1] 张玉良[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所,长春130033

出　　处：《光电工程》2011年第3期14-18,共5页Opto-Electronic Engineering

摘　　要：针对摩擦力矩对高精度转台速度稳定性能的影响,考虑到转台系统的实际工作情况,本文提出了一种基于变结构的双闭环控制方法。该方法根据变结构控制的不变性特点,采用指数趋近律规则,构造了基于变结构的双闭环控制方式。通过比对传统双闭环控制和基于变结构的双闭环控制在转台系统低速转动时的仿真分析及实验结果,表明本文提出的基于变结构的双闭环控制比传统双闭环控制可以更有效的克服摩擦力矩对高精度转台速度稳定性的影响,提高转台的速度稳定性能。In consideration of the requirement and structure of the practical turntable, the indispensable research on the force of friction is analyzed, which impacts the speed stability performance. A kind of control strategy based on the Variable Structure Control （VSC） is introduced. According to the invariant features and the exponentially approaching rule of the VSC, the new control strategy is designed by the application of traditional double closed loop control system and VSC system. According to the simulating results and the debugging results of the control strategy on the practical turntable system, we can validate that it agrees to the simulating results, which demonstrate the effectiveness of the control strategy based on VSC in improving the speed stability performance.

关 键 词：高精度转台 速度稳定性 双闭环控制 变结构控制 

分 类 号：TP273.4[自动化与计算机技术—检测技术与自动化装置]