化学机械抛光中磨粒运动特性离散元仿真研究  

Modeling and Simulation of Abrasive Flow in Chemical Mechanical Polishing Using Discrete Element Method

作　　者：谭援强[1] 张浩[1] 李明军[1] 

机构地区：[1]湘潭大学,湘潭411105

出　　处：《中国机械工程》2011年第5期597-603,共7页China Mechanical Engineering

基　　金：国家自然科学基金资助项目(50875224);教育部新世纪人才项目(NCET:06-0708);教育部博士学科点专项科研基金资助项目(20070530003)

摘　　要：基于耦合计算流体力学和计算散体力学的方法,利用PFC3D软件模拟了复合磨粒抛光液化学机械抛光(CMP)中抛光液固液两相流的流动行为。通过2个数值实验并将其与他人实验数据进行对比,验证了利用PFC3D软件模拟纳米两相流问题的可行性。对CMP过程进行了数值模拟,解释了一些实验中观测到的现象。According to coupling computational fluid dynamics and computational granular media mechanics method,the motion of abrasive flow in CMP with composite particles was simulated using discrete element method.With PFC3D software,a two-phase flow model that predicted the kinematics and trajectory of the abrasive particles was built herein,two verification simulations were conducted to demonstrate the capability of the current method to solve nano-size two-phase flow problems.Finally,the CMP geometry simulations were conducted,some phenomenon observed in the experiments were explained.

关 键 词：离散元法 化学机械抛光 磨粒流 数值模拟 复合磨粒 

分 类 号：TH16[机械工程—机械制造及自动化]