无牙颌患者戴不同厚度的上腭托对连续发[n]音时下颌位置的影响  

Influence of experimental palatal plate on mandibular position during continuous [n] phonation in complete denture wearers

作　　者：刘向晖[1] 大川周治 冯海兰[1] 

机构地区：[1]北京大学口腔医学院.口腔医院修复科,北京100081 [2]日本明海大学齿学部补缀分野

出　　处：《北京大学学报（医学版）》2011年第1期89-92,共4页Journal of Peking University:Health Sciences

摘　　要：目的:研究不同厚度的上腭托对无牙颌患者连续发[n]音时下颌位置的影响。方法:10名无牙颌患者,平均年龄为76.4岁。每一个患者按照随机原则,在不戴上腭托(对照组)和分别戴用3 mm、5 mm的上腭托时,用K7下颌运动轨迹描记仪记录下颌的位置,包括连续发[n]音4 s时下颌的位置和下颌息止颌位。结果:不戴上腭托(对照组)连续发[n]音时,垂直向的颌间距离的平均值为(1.69±1.26)mm,前后向的平均值为(1.74±1.18)mm,戴入实验上腭托后,在垂直向和水平向的颌间距离都稍有增加,但差异无统计学意义。不戴实验上腭托(即对照组)的息止颌位时,在垂直方向和水平方向的颌间距离的平均值分别是(2.91±2.28)mm和(2.56±1.88)mm,戴入实验上腭托后,在垂直向和水平向的颌间距离都稍有减小,即戴3 mm上腭托分别为(2.52±1.88)mm和(2.46±1.64)mm;戴5 mm上腭托的颌间距离分别为(2.45±1.70)mm和(2.22±1.31)mm,但差异无统计学意义。结论:总义齿患者连续发[n]音时,戴不同厚度的上腭托对下颌的颌间距离没有显著影响;总义齿患者戴不同厚度的上腭托对下颌息止颌位没有明显影响。Objective：To clarify the influence of an experimental palatal plate on the mandibular position during continuous [n] phonation and at the physiological rest position in complete denture wearers.Methods： Ten complete denture wears volunteers were investigated.Two kinds of experimental palatal plate with a thickness of 3 mm and 5 mm（from the denture basal surface to denture polished surface） were fabricated and used for each subject.The mandibular position was recorded by a K7 mandibular kinesiograph during continuous [n] phonation and at the physiological rest position under three conditions： wea-ring a palatal plate with different thickness of 3 mm,5 mm and without a plate（control）.The interocclusal distance both in vertical and anteroposterior direction during continuous phonation and physiological rest position under all three conditions were measured and compared.Results： Under the control condition without wearing of a plate,the mean values of interocclusal distance（IOD） during continuous [n] phonation were（1.69±1.26） mm vertically and（1.74±1.18） mm anteroposteriorly.After insertion of the experimental plates,there was an increase in the IOD during continuous [n] phonation,but this difference from the normal condition was not statistically significant.The mean IOD at the physiological rest position in these 2 directions were（2.91±2.28） mm and（2.56±1.88） mm,respectively.After insertion of the experimental plates,there was a decrease in the IOD,with the 3 mm plate,（2.52±1.88） mm vertically and（2.46±1.64） mm anteroposteriorly;with 5 mm plate,（2.45±1.70） mm vertically and（2.22±1.31） mm anteroposteriorly.No significant differences were found between the control and 2 experimental conditions.Conclusion： The mandibular position during continuous [n] phonation was not influenced by the experimental palatal plates and physiological rest position was also not affected by experimental palatal plates.

关 键 词：开 义齿 全口 垂直距离 牙 

分 类 号：R783.6[医药卫生—口腔医学]