Gd磁控溅射不锈钢薄膜生长形貌及附着性能研究  

Study on the Adhesion and Growth Morphologies of Stainless Steel Film on Gd by Magnetron Sputtering

作　　者：郑小秋[1] 谢世坤[1] 易荣喜[1] 吴卫[2] 

机构地区：[1]井冈山大学工学院,吉安343009 [2]西华大学材料学院,成都610039

出　　处：《材料导报》2011年第6期93-96,共4页Materials Reports

基　　金：国家863基金资助项目(2002AA324010);井冈山大学校内资助项目(JZ09023)

摘　　要：为探讨磁致冷材料Gd表面溅射保护膜后的附着性能,利用直流磁控溅射技术在Gd基体上镀不锈钢(1Cr18Ni9Ti)薄膜。采用扫描电镜(SEM)?能谱仪?扫描探针显微镜对薄膜进行了表征,并用引拉法测定了薄膜的附着强度。结果表明,不锈钢薄膜溅射初期呈岛状分布;溅射一定时间后薄膜呈层状生长,表面质量好,膜/基界面结合好,附着强度高,在功率密度为966W/cm2、溅射时间为8min时附着强度达到最大值24.7MPa。In order to study the adhesion of sputtering protective coating of Gd,Gd substrates were coated with 1Cr18Ni9Ti by means of DC magnetron sputtering technology. The characteristics of the film were investigated by scanning electron mieroscopy（SEM）, EDS, SPM and the adhesive strength of film was tested by tension test. The resuits show that the films of 1Cr18Ni9Ti present in island-like distribution when the sputtering was initiated and the grains are fibrous. When sputtering for a few minutes, the films are smooth and perfect, the interface bonding be tween 1Cr18Ni9Ti and Gd is strong, and when the sputtering density is 966W/cm^2 and the sputtering time is 8min, the largest adhesive strength is 24. 7MPa.

关 键 词：磁致冷材料 磁控溅射 不锈钢 薄膜 生长形貌 附着强度 

分 类 号：TG174.71[金属学及工艺—金属表面处理]