离子束刻蚀机的电源系统  

Power supply system of ion beam etching machine

作　　者：陈元棣 谈治信 

机构地区：[1]上海微高精密机械工程有限公司,上海200136 [2]兰州物理研究所,甘肃兰州730000

出　　处：《真空》2011年第2期56-59,共4页Vacuum

摘　　要：离子束刻蚀机的性能,除主机外,在很大程度上取决于供电电源系统。为了提高离子束刻蚀机整机工作的稳定性,在以往的配套电源的基础上,研制了一套电源系统,用于离子束刻蚀机中。整机工作稳定度达±0.8%/h,每次连续刻蚀器件8h以上,连续运转3年多,电源系统稳定可靠。是国内离子束刻蚀机电源系统性能较好的供电电源系统。The properties of ion beam etching machine depends upon the power supply system to a great extent besides the main engine.So in order to enhance the working stability,a set of power supply system was developed for the ion beam etching machine.The stability of the machine is up to ±0.8%h and can etch continuously for above 8h.The power supply system is still stable after working continuously for over 3 years and is a good one in home ion beam etching machines.

关 键 词：离子束刻蚀 离子源 真空系统 稳流电源 稳定度 

分 类 号：TB43[一般工业技术] TH7[机械工程—仪器科学与技术]