电子束蒸发制备碳化硼微球涂层的工艺研究  

Process of boron carbide micro-shell coatings deposited by electron beam evaporation

作　　者：陶勇[1] 廖志君[1] 王自磊[1] 范强[1] 伍登学[1] 卢铁城[1] 

机构地区：[1]四川大学物理系和辐射物理及技术教育部重点实验室,成都610064

出　　处：《四川大学学报（自然科学版）》2011年第2期395-399,共5页Journal of Sichuan University(Natural Science Edition)

基　　金：国家自然科学基金基础科学人才培养基金(J0830308)

摘　　要：自行设计一套筛网反弹盘三维沉积装置,用于电子束蒸发制备碳化硼微球涂层.采用电子束蒸发法并结合此装置在直径为1 mm的玻璃小球表面沉积了碳化硼涂层.研究了筛网振动频率、电子束制备工艺对沉积速率、涂层厚度以及涂层表面粗糙度的影响.采用X射线照相技术测试涂层的厚度;XPS测试涂层表面成分;AFM表征涂层的表面形貌和均方根粗糙度.结果表明:涂层主要成分为B_4C,表面较为光滑、均匀;当筛网振动频率为0.25 Hz,且电子束蒸发工艺参数定为:真空度P小于3×10^(-3) Pa,高压U等于6 kV,束流I在100 mA～120mA之间时,所制涂层表面形貌最佳.A 3D system of deposition was designed and used to deposit boron carbide micro-shell coatings with electron beam evaporation. The coatings were deposited with the mandrel of marbles whose diameters are 1ram. The effect of the vibration frequency of screen and preparation process of electron beam on the deposition rate, and the thickness and roughness of coatings were investigated. The thickness and components of coatings were measured by X-ray radiography and X-ray photoelectron spectroscopy （XPS）, respectively. The surface roughness of coating was characterized by atomic force microscope （AFM）. The results reveal that the main ingredients of the coatings are B4C and the surfaces of the coatings are quite smooth and homogeneous. The surface topography of the coatings are optimum at the vibration frequency of screen is 0.25Hz, vacuum under 3 ×10^-3Pa, high pressure being 6 kV and beam current from 100 mA to 120 mA.

关 键 词：电子束蒸发 涂层 沉积时间 

分 类 号：O484.5[理学—固体物理]