悬臂梁接触式RF MEMS串联开关工艺设计  被引量:2

Process Design of Cantilever Contact RF MEMS Series Switches

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作  者:柏鹭[1,2] 高杨[2] 郑英彬[2] 贾小慧[1] 王强[3] 

机构地区:[1]西南科技大学信息工程学院,四川绵阳621010 [2]中国工程物理研究院电子工程研究所,四川绵阳621900 [3]西南科技大学制造科学与工程学院,四川绵阳621010

出  处:《微纳电子技术》2011年第4期258-263,共6页Micronanoelectronic Technology

基  金:中国工程物理研究院科技发展基金重点课题(2008A0403016,2010A0302013)

摘  要:报道了一款用于X波段的悬臂梁接触式RF MEMS串联开关的微加工工艺设计。首先,介绍了该悬臂梁接触式MEMS串联开关的基本工作原理;然后,简单描述了其结构组成和尺寸参数;最后,对掩膜版和对位标记的设计做了相应介绍。工艺方案设计包括初步工艺设计和根据实际加工条件的方案优化设计。初步工艺方案中加工步骤繁琐并需要两层牺牲层,制作难度大,难以保证较高的成品率。考虑实际加工条件的优化设计,采用聚酰亚胺作为牺牲层,使得牺牲层减少到一层。利用PECVD工艺沉积SixNy和溅射Au工艺得到了悬臂梁结构,简化了工艺流程,可提高工艺成品率。The micro-machining process design of a cantilever contact X-band RF MEMS series switch was presented.Firstly,the basic working principle of the cantilever contact RF MEMS series switch was introduced.Then,the composition and size parameters were briefly given.Finally,the designs of the mask and position mark were described.The design scheme of the micromachining process includes the preliminary design and the design optimization according to the practical machining condition.The processing steps in the initial design are cumbersome and require two sacrificial layers,thus it is difficult to fabricate and high yield can't be guaranteed.The polyimide was used as the sacrificial layer for the optimized design considering the practical machining condition,thus the sacrificial layer was reduced to one layer.SixNy was deposited by PECVD and Au was sputtered,hence the cantilever structure was obtained.It simplifies the micro-machining process and helps to enhance the yield.

关 键 词:微电子机械系统(MEMS) 悬臂梁 开关 X波段 工艺流程 

分 类 号:TH703[机械工程—仪器科学与技术] TN631[机械工程—精密仪器及机械]

 

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