面向掩模精化的表面微加工MEMS器件几何建模  

Geometrical Modeling for Mask Refinement of Surface Micromachined MEMS Devices

作　　者：赵晓霞[1] 李建华[1] 凌浩[1] 刘玉生[2] 郭卫斌[1] 何高奇[1] 

机构地区：[1]华东理工大学计算机科学与工程系,上海200237 [2]浙江大学计算机辅助设计与图形学国家重点实验室,杭州310027

出　　处：《微电子学》2011年第2期293-299,共7页Microelectronics

基　　金：国家自然科学基金资助项目(60703026);浙江省自然科学基金资助项目(Y107112);上海市自然科学基金资助项目(10ZR1408200)

摘　　要：MEMS器件设计流程中,为优化MEMS器件,常常需要对MEMS掩模进行精化设计。为了在MEMS精化设计中同步更新MEMS掩模与几何模型,提出一种面向掩模精化的表面微加工MEMS器件几何建模方法。该方法主要通过建立MEMS器件几何模型和工艺模型之间的依赖关系图,通过变动依赖关系,求出掩模精化所影响的几何元素,而后在几何模型中仅仅更新所影响的几何元素;对于所对应的几何模型存在拓扑突变等情况,该方法采用参数限定或局部几何模拟进行更新。实例分析表明,提出的几何建模方法能快速有效地响应掩模精化,从而有效地促进MEMS器件设计。To optimize MEMS devices,incremental refinement of the MEMS masks is needed in MEMS design.In order to update geometric model of MEMS device in mask refinement,a geometry modeling method for mask refinement of surface micromachined MEMS devices was proposed.A dependency graph of MEMS device was constructed on inherent relationship of 3-D geometrical model and process model of MEMS device;and after mask refinement,inconsistent elements of the 3-D model were determined based on the dependency graph.The new geometrical model was constructed by updating inconsistent elements.In addition,parameter bound and local process simulation approaches were used in updating the geometric model with topological change in refinement.Finally,some test results were given.

关 键 词：计算机辅助设计 微机电系统 表面微加工 几何建模 掩模精化 

分 类 号：TN402[电子电信—微电子学与固体电子学]