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作 者:许晓静[1] 郝欣妮[1] 夏登福[1] 陈丹[1] 田琨[1] 辛喜玲[1]
机构地区:[1]江苏大学先进成形技术研究所,镇江212013
出 处:《机械工程材料》2011年第3期83-86,共4页Materials For Mechanical Engineering
基 金:江苏省自然科学基金重点资助项目(BK2007707);教育部留学回国人员启动基金资助项目(教外司2006-331)
摘 要:采用室温磁控溅射技术在AZ91D镁合金表面制备了CN_x/SiC双层薄膜(SiC为中间层),研究了界面结合情况、薄膜的力学和摩擦磨损性能。结果表明:CN_x/SiC双层薄膜表面颗粒结合紧密,中间层SiC与基体和CN_x层界面的结合很好,均发生了呈梯度的元素扩散,膜基附着力在12N以上;CN_x薄膜具有低的纳米硬度(3.85GPa)、低的弹性模量(30.46GPa),但却具有高的硬度与弹性模量比值(0.126)以及好的摩擦磨损性能;在以氮化硅(Si_3N_4)球为对偶件的室温干摩擦条件下,其摩擦因数约为0.19,磨损率为4.89×10^(-6)mm·m^(-1)·N^(-1)。CNx/SiC bilayer films (SiC as interlayer) were prepared on AZ91D Mg alloy surface by using magnetron sputtering technique at room temperature. The interracial bonding, friction and wear properties as well as mechanical properties of the film were investigated. The results show that the surface particles of CNx/SiC bilayer films were closely combination, the SiC interlayer had good combination with the substrate and the CNxlayer, which had gradient dements diffusion and the adhension force was larger than 12 N. The CNx films had low nano-hardness of 3. 85 GPa, low elastic modulus of 30. 46 GPa, high ratio of hardness and elastic modulus of 0. 126 and good friction and wear propertiex The friction coefficient of the film was about 0. 19 when using Si3N4 balls as friction pairs under dry friction condition at room temperature, and the wear rate was 4. 89×10^-6 mm^3·m^-1·N^-1.
分 类 号:TG174.4[金属学及工艺—金属表面处理]
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