无牙下颌种植全口覆盖义齿不同上部结构光弹模型的建立  

Establishment of the mandibular edentulous photoelastic model of various retention mechanism on implanted complete overdentures

作　　者：宋芳[1] 张少锋[1] 白石柱[1] 关卿[1] 

机构地区：[1]第四军医大学口腔医学院,陕西西安710032

出　　处：《牙体牙髓牙周病学杂志》2011年第3期146-148,共3页Chinese Journal of Conservative Dentistry

摘　　要：目的:建立无牙颌光弹模型,为研究不同上部结构的种植全口覆盖义齿种植体周围支持组织的应力分布提供基础模型。方法:以光弹性环氧树脂模拟下颌骨,牙龈硅橡胶模拟牙槽黏膜。采用临床常用种植体、4种上部附着结构,按临床实际操作步骤制得双种植体支持的下颌全口覆盖义齿光弹模型。以正中全牙列加载为例测试光弹应力。结果:制得含种植体的环氧树脂光弹模型呈淡黄色,质地均匀,透明,无初应力,为应力测试提供了良好的实验基础。结论:该模型可用于定性分析种植体周围支持组织内的应力分布情况。AIM： To establish the edentulous photoelastic model so as to provide a basic model for the research of stress distribution in the supporting structures around the implants on the implanted complete overdentures which were applied with various retention mechanisms.METHODS： The photoelastic ethoxyline resin and silicone rubber gum were used to simulate the mandible and alveolar mucosa respectively.Following the clinical practice steps,common clinical implants and 4 types of upper attachments were used to establish the 2-implants supported mandibular complete overdenture photoelastic model.Photoelastic stress was measured in the case of the middle of complete denture loading.RESULTS： The obtained ethoxyline resin model was faintly yellowish,homogeneous,transparent,and with no natural stress.The model offered a good experimental basis for the stress measurement.CONCLUSION： The model is applicable to the qualitative analysis of the stress distribution in the supporting structures around the implants.

关 键 词：光弹性法 种植全口覆盖义齿 无牙下颌 应力 

分 类 号：R780.5[医药卫生—口腔医学]