离子注入表面的形态变化分析  

ANALYSIS OF CHANGES IN SURFACE FORMS AFTER ION IMPLANTATION

作　　者：王明红[1] 章宗城[2] 

机构地区：[1]上海工程技术大学机械工程学院,上海200336 [2]中国纺织大学,上海200051

出　　处：《上海工程技术大学学报》1999年第2期102-109,共8页Journal of Shanghai University of Engineering Science

摘　　要：通过对离子注入表面的二维和三维表面粗糙度评定参数的测量和分析，发现各评定参数随注入能量和剂量的变化有不同的变化趋势，同时，对不同能量和剂量分析了注入表面自相关函数和功率谱函数的变化，较全面地研究了离子注入对表面粗糙度的影响，取得了若干规律性倾向。Through the measurement and analysis of assessment parameters of the surface roughness of 2-D and 3-D for the implanting surface,it was found that the different tendencies of the change in various assessment parameters were presented, depending on the change in implanting energy and dose. Simu1tan^us1y,the change in the autocorrelation function and the power spectrum was ana- lyzed for the surfaces of different energy and dose. Thus, a comprehensive study has be made of the effects on surface roughness through ion implantation and several regular tendencies have been found.

关 键 词：离子注入 表面粗糙率 表面形貌学 金属材料 

分 类 号：TG156.8[金属学及工艺—热处理] TG174.445[金属学及工艺—金属学]