双面抛光运动的数学建模及轨迹优化  

Mathematical modeling and trajectory optimization of double-sided polishing process

作　　者：张彦[1] 李军[1] 朱永伟[1] 高平[1] 李标[1] 蒋毕亮[1] 左敦稳[1] 

机构地区：[1]南京航空航天大学机电学院,南京210016

出　　处：《光学技术》2011年第3期279-283,共5页Optical Technique

基　　金：国家自然基金项目资助(50905086);中国博士后基金项目资助(200904501095);江苏省自然基金项目资助(BK2010512);南京航空航天大学基本科研业务费专项科研项目资助(NS2010127)

摘　　要：双面抛光运动过程复杂,对光学材料的加工有重要的影响,运动轨迹分布不但影响加工效率,而且影响加工工件的表面质量。通过分析双面抛光加工的运动过程,建立双面抛光中任意一点相对于上抛光盘的运动轨迹的数学模型,改变数学模型中的轨迹运动参数,观察不同参数值对抛光轨迹分布的影响,优化分析得出抛光轨迹分布最佳的运动参数值。研究结果表明,工件在行星轮中的位置远离行星轮的回转中心,行星轮与整个抛光盘半径比为0.3,抛光盘与内齿轮的转速比在3~8倍之间,内外齿轮的转速比在1~4倍的范围内,获得的抛光轨迹最优。The trajectory of double-sided polishing is very complicated and has an important influence on the polishing process of the optical materials.The trajectory affects not only the processing efficiency,but also the surface quality.The movement of double-sided polishing process is discussed,and the mathematical model of the trajectory is established,which refers to any point of the planetary gear relative to the pad.By changing the parameters of the equation,the distribution of trajectories and the effect of different parameters are observed,and finally the optimal parameters of the trajectory are obtained.As the results shown,when the workpiece in the planetary gear keeps away from the center of planets,the radius ratio between planetary gear and top plate is 0.3,and the relative speed range between top plate and sun gear is 3~8,and the speed ratio range between ring gear and sun gear is in the time 1~4,the optimal trajectory is obtained.

关 键 词：光学材料 双面抛光 数学建模 轨迹优化 

分 类 号：TG74[金属学及工艺—刀具与模具]