靶基距对射频磁控溅射法制备氟碳膜的结构与性能影响  

The study on structure and properties of fluorocarbon films prepared by RF magnetron sputtering at varying target-substrate distance

作　　者：刘增机[1,2] 纪全[1,2] 张浴晖[1] 夏延致[1,2] 王凤军[1,2] 

机构地区：[1]青岛大学化工学院,山东青岛266071 [2]青岛大学纤维新材料与现代纺织国家重点实验室培育基地,山东青岛266071

出　　处：《功能材料》2011年第5期918-920,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50673046)

摘　　要：采用射频磁控溅射法,以聚四氟乙烯(PT-FE)为靶,氩气为载气,在再生纤维素基底上制备了氟碳膜。用原子力显微镜(AFM)、X射线光电子能谱(XPS)和静态接触角测试仪对氟碳膜的表面形貌、表面结构和表面性能进行了研究。结果表明,该法制得的氟碳膜是由纳米粒子组成的岛状结构,岛的表面起伏不平。这种氟碳膜由—CF3、—CF2—、—CF—和—C—4个组分构成,靶基距从30mm增加到80mm时,氟碳膜的F/C从0.551减小到0.427,呈逐渐减小的趋势。随着靶基距的增大,接触角从107°逐渐减小到75°,减小靶基距有利于提高氟碳膜的疏水性能。Fluorocarbon films were prepared by RF magnetron sputtering on regenerated cellulose substrate,used PTFE as the target and used Ar as the working gas.The atomic force microscope（AFM） was employed to determine the morphology of the surface.The structure of fluorocarbon films was investigated by means of XPS,and the contact angle was measured by the static contact angle testing apparatus.It was found that the obtained fluorocarbon films demonstrated islands-structure which were composed of nanosized particles and the surface of islands was not even.The fluorocarbon films which consisted of four components,i.e.—CF3,—CF2—,—CF— and —C—.The ratio of fluorine to carbon（F/C） of films drops from 0.551 to 0.427 and the contact angle drops from 107 to 75° with the increase of the target-substrate distance from 30 to 80mm,decreasing the target-substrate distance is beneficial to enhance hydrophobicity of fluorocarbon films.

关 键 词：射频磁控溅射 靶基距 AFM XPS 接触角 

分 类 号：O484[理学—固体物理] O461[理学—物理]