RB-SiC表面改性Si涂层的制备与性能  

Preparation and performance of Si coating on RB-SiC mirror for surface modification

作　　者：苑永涛[1] 刘红[1] 邵传兵[1] 陈益超[1] 方敬忠[1] 

机构地区：[1]中国科学院光电技术研究所,成都610209

出　　处：《强激光与粒子束》2011年第5期1281-1284,共4页High Power Laser and Particle Beams

基　　金：中国科学院光电技术研究所领域前沿部署课题(C09K007)

摘　　要：为了获得高质量光学表面的碳化硅反射镜,利用射频磁控溅射方法,在直径70 mm的RB-SiC基片上沉积了厚约100μm的Si改性涂层,对改性层进行超光滑加工,并对改性层的表面形貌及性能进行了测试。ZYGO表面粗糙度仪测试结果表明,抛光后Si改性涂层表面粗糙度均方根值达到了0.496 nm;X射线衍射仪测试显示,制备Si改性涂层为多晶结构;使用拉力机做附着力测试,结果表明膜基附着力大于10.7 MPa。证明采用磁控溅射技术制备的Si改性涂层均匀、致密、附着力好,能够满足RB-SiC材料表面改性要求。In order to manufacture reaction bonded silicon carbide（RB-SiC） mirrors of fine optical surface,100 μm thick Si coatings were prepared by RF magnetron sputtering on RB-SiC substrates of 70 mm diameter and then polished.Tests with ZYGO surface profilometer show that the RMS surface roughness of the surface-modified RB-SiC achieves 0.496 nm.X-ray diffraction analyses reveal the polycrystalline structure of the Si coatings.Moreover,the adhesion between Si coating and RB-SiC substrate measured by direct pull-off method is more than 10.7 MPa.Therefore,the magnetron sputtered Si coating can satisfy the requirements of RB-SiC surface modification.

关 键 词：RB-SIC 射频磁控溅射 表面改性 表面粗糙度 

分 类 号：O484[理学—固体物理]