ZnO系低压压敏薄膜的喷雾热分解法制备及膜厚对其压敏特性影响的研究  

The Preparation of Low Voltage ZnO-Based Varistor by Spray Pyrolysis and the Study of Dependence between the Thickness and Nonlinear Characteristics

作　　者：贾锐[1] 曲风钦[2] 武光明[1] 宋世庚[1] 陶明德[1] 

机构地区：[1]中国科学院新疆物理研究所,新疆乌鲁木齐830011 [2]烟台大学物理系,山东烟台264005

出　　处：《功能材料》1999年第6期636-638,共3页Journal of Functional Materials

摘　　要：本研究首次报导了利用喷雾热分解法成功地制备出ＺｎＯ 低压压敏薄膜。沉积温度３５０ ℃，沉积时间２ｈ ，退火温度６５０ ℃，ＸＲＤ 谱表明薄膜已良好晶化且薄膜的生长具有取向性。所制备的薄膜的非线性系数 α可在７ ．９９ ～２２ ．３８ 之间变化。压敏电压Ｖ１ｍＡ可在１３ ．５８ ～２５ ．３１ 之间任意变化；实验证明薄膜的厚度是决定压敏电压和非线性系数大小的重要因素之一。This paper reports ZnO low voltage thin film varistor prepared by spray pyrolysis for the first time.The depositing temperature is 350℃;depositing time is 2h;annealing temperature is 650℃.XRD patterns shows that the thin film is well crystallized and crystal growth is oriented.The thin film's nonlinear coefficient varies from 7.99 to 22.38 and it's nonlinear voltage (V 1mA ) from 13.58 to 25.31. Experimental result shows that the thin film's thickness is one of the most important factors in determining ZnO thin film's nonlinear voltage (V 1mA ) and its nonliear coefficient (α ).

关 键 词：氧化锌 低压压敏薄膜 喷雾热分解 压敏电压 

分 类 号：TP212[自动化与计算机技术—检测技术与自动化装置] O484[自动化与计算机技术—控制科学与工程]