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机构地区:[1]Institute of VLSI Design, Zhejiang University, Hangzhou 310027, China
出 处:《Chinese Science Bulletin》2011年第12期1267-1271,共5页
摘 要:Low-frequency noises in GaAs MESFET are usually observed when investigating the drain current and substrate leakage current under sidegate bias conditions. Experimental results show that the magnitude of low-frequency noises is in a direct dependency upon the sidegate bias and the noises in drain current will disappear if sidegate bias increases more negatively beyond a certain voltage. A mechanism associated with the substrate conductivity and the channel-substrate junction modulated by sidegate bias is proposed to explain the fluctuation of low-frequency noises.Low-frequency noises in GaAs MESFET are usually observed when investigating the drain current and substrate leakage current under sidegate bias conditions. Experimental results show that the magnitude of low-frequency noises is in a direct dependency upon the sidegate bias and the noises in drain current will disappear if sidegate bias increases more negatively beyond a certain voltage. A mechanism associated with the substrate conductivity and the channel-substrate junction modulated by sidegate bias is proposed to explain the fluctuation of low-frequency noises.
关 键 词:砷化镓MESFET 低频噪音 泄漏电流 导电性 衬底 通道 基体 GAAS
分 类 号:TN386[电子电信—物理电子学]
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