以W为中间层的C/W多层膜的微观结构及性能研究  

Investigation of Microstructure and Performance of C/W Multilayer Coatings with W Interlayer

作　　者：陈迪春[1] 蒋百灵[2] 时惠英[2] 付杨洪[2] 

机构地区：[1]西安理工大学现代分析测试中心,西安710048 [2]西安理工大学材料科学与工程学院,西安710048

出　　处：《材料工程》2011年第4期33-37,共5页Journal of Materials Engineering

基　　金：国家重点基础研究发展计划(973计划)资助项目(2009CB724406)

摘　　要：利用非平衡磁控溅射技术在钢基体上制备以W为中间层的C/W多层膜,使用扫描电子显微镜(SEM)、X射线衍射仪(XRD)和透射电子显微镜(TEM)对镀层的表面形貌,相组成及截面微观结构进行分析;测试镀层的膜基结合强度和摩擦性能。结果表明:C/W多层膜是由非晶碳和WC纳米晶组成的复合镀层,具有明显的层状结构,周期厚度为6.5nm;镀层具有良好的减摩性能,摩擦因数随偏压的增大而降低,-90V偏压条件下沉积的镀层具有最低的摩擦因数(0.14);镀层的膜基结合强度较差,W中间层的厚度为500nm,W中间层中存在较高的压应力,没有起到强化膜基结合强度的作用。C/W multilayer coatings with W interlayer were deposited on steel substrates using unbalanced magnetron sputtering.The surface morphology,phase composition and cross-section microstructure were analyzed by SEM,XRD and TEM method.The tribological property and adhesion of film to substrate were tested.The results show that the coating is a composite coating composed of amorphous carbon and nanocrystalline WC,which has a clear multilayer structure with a periodical thickness of 6.5nm.The friction coefficient decreases with the increasing in substrate bias,the coatings deposited at-90V bias have the lowest friction coefficient,the value is 0.14.Thickness of W interlayer is 500nm,the use of W interlayer does not enhance the adhesion of film to substrate due to the generation of high compressive stresses in W interlayer.

关 键 词：磁控溅射 C/W多层膜 微观结构 结合强度 摩擦性能 

分 类 号：TG174[金属学及工艺—金属表面处理] TB43[金属学及工艺—金属学]