跳动及滚动激励制备的碳化硼涂层表面形貌的对比  

Comparison of the surface morphologies of boron carbide coatings prepared by bouncing agitation and rolling agitation

作　　者：王自磊[1] 廖志君[1] 陶勇[1] 于小河[1] 林涛[1] 伍登学[1] 卢铁城[1] 

机构地区：[1]四川大学物理系和辐射物理及技术教育部重点实验室,成都610064

出　　处：《四川大学学报（自然科学版）》2011年第3期617-620,共4页Journal of Sichuan University(Natural Science Edition)

基　　金：国家自然科学基金基础科学人才培养基金(J0830308)

摘　　要：利用电子束蒸发技术蒸发碳化硼,通过弹跳激励和滚动激励两种方案来随机滚动小球,从而分别在玻璃和钢球心轴上制备了碳化硼涂层.采用扫描电子显微镜对涂层表面形貌进行了分析.同采用弹跳激励制备的涂层相比,在用滚动激励制备的涂层表面不存在裂纹和微粒脱落现象,其微粒生长的更大,相互接合的更致密.经对比证明,在制备碳化硼涂层上,滚动激励装置优于跳动激励装置.Boron carbide（B4 C） coatings are deposited on the glass and steel mandrels using two agitation methods, rolling agitation and bouncing agitation, by electron beam evaporation. Various surface morphologies of the coatings are investigated through the scanning electron microscope. It is found that the surface deposited by rolling agitation has fewer cracks and better compactness, and the particles grow better than that deposited by bouncing agitation. From a comparison of two kinds of B4 C coatings, one can find that rolling agitation has more advantages than bouncing agitation in fabricating boron carbide coatings.

关 键 词：ICF靶 碳化硼涂层 电子束蒸发 弹跳激励 滚动激励 

分 类 号：O484.5[理学—固体物理]