应用于场致发射的掺杂纳米金刚石膜的研究  

On the doped nanocrystalline diamond films applied to field emission display

作　　者：陈冠虎[1] 汪建华[1] 熊礼威[1] 翁俊[1] 王文君[1] 

机构地区：[1]武汉工程大学材料与工程学院湖北省等离子体化学与新材料重点实验室,湖北武汉430073

出　　处：《真空》2011年第3期43-48,共6页Vacuum

摘　　要：场致发射是一种新型显示技术,具有良好应用前景,场发射显示器的核心内容是场发射阴极材料,纳米金刚石由于低表面粗糙度、低场发射强度、高发射电流密度、大比表面积、网状结构以及高密度悬挂键等优秀电化学性能成为场发射的理想阴极材料。本文阐述了化学气相沉积法制备纳米金刚石薄膜的沉积装置、预处理和工艺参数,并介绍了金刚石掺杂机理和掺入元素的研究现状。Field emission display is a new flat plate technology with promising prospect,and the core of the field emission display is field emission cathode materials.Nanocrystalline diamond is an ideal field emission cathode for its excellent electrochemical properties as low surface roughness,low field emission intensity,high emission current density,large specific surface area,network structure and high-density dangling bonds.The deposition equipment,pretreatment and process parameters of depositing nanocrystalline diamond films by chemical vapor deposition were described,and the recent research of doping mechanism and doped elements were also introduced.

关 键 词：场致发射 纳米金刚石薄膜 掺杂 

分 类 号：TB43[一般工业技术] O472[理学—半导体物理]