CVD金刚石薄膜与硬质合金的结合力的改善途径  

Improvement approachs for the bonding force of CVD diamond film and cemented carbide substrates

作　　者：毕晓勤[1] 王冰[1] 陈金身[1] 王琦[1] 

机构地区：[1]河南工业大学材料科学与工程学院,河南郑州450007

出　　处：《超硬材料工程》2011年第1期18-20,共3页Superhard Material Engineering

基　　金：河南省科技厅重点攻关项目(072102260015);河南省高等学校青年骨干教师资助计划

摘　　要：化学气相沉积金刚石涂层硬质合金工具综合了金刚石和硬质合金的优异性能,可广泛应用于难加工材料的切削、电子工业等诸多领域。制造金刚石薄膜涂层工具的关键在于增强金刚石膜与硬质合金基体间的结合力。文章综述了增强化学气相沉积金刚石膜与硬质合金基体结合力的多种措施。Cemented carbide tools with diamond thin films grown up by CVD have outstanding performances of diamond and carbide.It is widely applied for cutting of difficult processing materials,electronic industry and many other fields.But the key point of this kind of tools is to enhance the bonding force between diamond film and carbide.This paper generally describes the various measures to enhance the bonding force between diamond film and carbide.

关 键 词：硬质合金 CVD 综述 金刚石 薄膜 

分 类 号：TG174.4[金属学及工艺—金属表面处理]