激光制备类金刚石膜技术研究  

Research of Diamond-like Carbon Film Deposited by Pulsed Laser

作　　者：程勇[1] 王淑云[1] 郭延龙[1] 杨雪[1] 陆益敏[1] 

机构地区：[1]武汉军械士官学校光电技术研究所,湖北武汉430075

出　　处：《光学与光电技术》2011年第3期51-55,共5页Optics & Optoelectronic Technology

基　　金：国家863计划(2009AA701××××);国家安全重大基础研究项目(973计划)(613108020303)资助项目

摘　　要：现有技术制备的类金刚石(DLC)膜由于含氢、硬度低、内应力大、附着力差等特点,严重限制了其光学工程应用。激光法是近年发展的一种制备DLC膜的新方法,相比其他制备方法具有诸多优点。综合分析了激光制备DLC膜过程中,激光波长、脉宽、功率密度、衬底温度和偏压等因素对薄膜质量的影响规律。采用氧气氛辅助沉积、元素掺杂和双波长激光复合沉积等关键改进技术,实现了在Si、Ge等基底上激光制备DLC膜光学工程化应用。Diamond-like carbon （DLC） film in existence has characteristics, such as hydrogen-containing, low hardness, large inner-stress and bad adhesion. So it can not be used in optical engineering application. Pulsed laser deposition （PLD） is a new method developed in recent years. Compared to other deposition methods, it has many advantages. Influence of fac tors to DLC film in PLD process is analyzed synthetically. These factors mainly contain laser wavelength, pulse width, power density, temperature and voltage of substrate. Technics of oxygen ambient assistant-deposition, element doping and de- positing with two laser beams of different wavelength are adopted. DLC films have been deposited on Si and Ge substrates by PLD and realized optical engineering application. It is hopeful to achieve optical engineering application of DLC films by PLD.

关 键 词：类金刚石膜 激光沉积 氧气氛 掺杂 

分 类 号：O484[理学—固体物理]