红外双波段激光滤光膜的研制  

Design and manufacture of infrared double waveband laser filter films

作　　者：宫大为[1] 付秀华[1] 耿似玉 杨道奇[1] 

机构地区：[1]长春理工大学光电工程学院,吉林长春130022 [2]新美亚科技(深圳)有限公司,广东深圳518038

出　　处：《中国光学》2011年第3期293-298,共6页Chinese Optics

摘　　要：为了满足红外军用仪器的特殊要求,根据薄膜理论进行了红外双波段滤光膜的膜系设计;采用电子束真空镀膜的方法,通过对工艺参数的调整,在多光谱ZnS基底上镀制了1 064 nm高反、3～5μm高透的红外双波段滤光膜。利用低能离子轰击,使膜层与基底间的应力明显减小;使用BGS 6341薄膜应力测试仪,采用渐变梯度法,测得其压应力由122 MPa降到51 MPa。另外,通过低能离子轰击和真空退火处理,提高了膜层的抗损伤阈值。结果显示所镀膜层满足红外军用仪器的使用要求。In order to meet the special requirements of infrared military equipment,an infrared double waveband filter film system was designed according to the theory of thin film and an infrared dual-band filter membrane with a high reflection at 1 064 nm and a high antireflection in 3~5 μm was produced on a multi-spectral ZnS substrate by adjusting process parameters and using electron beam vacuum deposition.With ion bombardment of low energy and vacuum annealing,the anti-damage threshold of thin film was improved.Furthermore,the stress between the film layer and the substrate was reduced to 51 MPa from 122 MPa measured by the BGS 6341 stress tester with gradient method.This film meets the requirements of infrared military equipment.

关 键 词：光学薄膜 激光滤光膜 离子轰击 真空退火 

分 类 号：O484.1[理学—固体物理]