化学气相沉积法制备钨管性能研究  

The Research of Performance of Tungsten Tube Prepared by Chemical Vapor Deposition

作　　者：马捷[1] 魏建忠[1] 王从曾[1] 范爱玲[1] 

机构地区：[1]北京工业大学材料科学与工程学院,北京100124

出　　处：《兵工学报》2011年第6期703-706,共4页Acta Armamentarii

摘　　要：以WF6、H2为原料,采用化学气相沉积法沉积制备出不同直径难熔金属钨管。对不同沉积温度(500℃,600℃,700℃)沉积制备钨管的纯度、密度、显微硬度、残余应力及钨管强度进行了测试与分析研究。研究结果表明:沉积制备钨管具有高纯度和高致密度;随着沉积温度、钨管半径(3～20 mm)不同,显微硬度值在500～800 HV之间;沿钨管圆周、半径方向存在较大残余应力;抗拉强度范围在300～500 MPa.Refractory metal tungsten tubes of different diameter have been prepared successfully by chemical vapor deposition with the mixture of WF6 and H2.The purity,density,micro-hardness,residual stress and strength of tungsten tubes at different deposition temperatures（500℃,600℃,700℃） were tested and analyzed.The results show that tungsten tubes prepared in this way demonstrate high purity and high density.At different deposition temperatures,micro-hardness values of tungsten tube of different radius（3-20mm） change between 500 and 800HV.A relatively high residual stress exists along the tungsten tube circumference,radius of the direction.And the tensile strength range is 300-500MPa.

关 键 词：金属材料 化学气相沉积 钨 组织 性能 

分 类 号：TB31[一般工业技术—材料科学与工程]