金属钨涂层制备工艺的研究进展  

Research progresses on preparation technologies of tungsten coating

作　　者：刘艳红[1] 张迎春[1] 葛昌纯[1] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083

出　　处：《粉末冶金材料科学与工程》2011年第3期315-322,共8页Materials Science and Engineering of Powder Metallurgy

基　　金：国际热核聚变实验堆(ITER)计划专项(2010GB109002);国家重点基础研究发展规划(973计划)资助项目(2008CB717802);教育部新世纪优秀人才培养计划资助项目(NCET-07-0261)

摘　　要：金属钨属于难熔金属,具有高的强度和硬度,同时具有良好的化学稳定性,不易受到腐蚀,但其昂贵的价格及难加工特性限制了其应用,因此,用金属钨作为涂层材料来改善基体材料的性能,引起了众多研究者的关注。该文综述纯金属钨涂层的几种重要制备方法,包括:熔盐电镀法,等离子喷涂法,爆炸喷涂法,气相沉积法等。等离子喷涂是钨涂层制备中最为成熟的1种方法,基体材料不受限制,涂层厚度容易控制。熔盐电镀法能够通过电化学反应从化合物中一步获得厚度均匀的金属钨涂层,并且可避免引入氧和碳等杂质。化学气相沉积法获得的钨涂层致密度高;物理气相沉积法可以在任意基材上获得钨涂层。同时介绍这些方法各自的技术特点和目前的研究现状,并对金属钨涂层的制备方法进行展望。Tungsten with high strength and hardness,belongs to refractory metal,and it can not be eroded by acids due to its＇ high chemical stability.However,the application of tungsten is limited by its＇ high price.Therefore,using tungsten as a coating material to improve the performance of metal matrix has received more attentions around the world.The present paper reviews several important preparation technologies of tungsten coating,such as electrodeposition in molten salt,vacuum plasma spraying technique（VPS）,detonation gun spraying technique and vapour deposition.The characters and recent development of these preparation technologies are introduced,and the fabrication methods are also prospected in the present paper.

关 键 词：钨涂层 电镀 喷涂 气相沉积 制备 

分 类 号：TF841.1[冶金工程—有色金属冶金]