多层膜沉积对光栅衬底槽形影响研究  

Effect of Multilayer Coatings on Groove Shapes of Grating Substrates

作　　者：张立超[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春130033

出　　处：《光机电信息》2011年第7期16-20,共5页OME Information

基　　金：国家自然科学基金项目(No.60678034);国家科技重大专项项目

摘　　要：衍射效率的高低是衡量极紫外多层膜光栅的最重要指标。为实现高衍射效率,必须发展合适的多层膜沉积方法,以确保在镀膜过程中光栅衬底的槽形不发生变化。针对极紫外波段所采用的矩形光栅衬底,对其镀膜过程中的槽形变化进行了考察。结果表明,多层膜周期数对保持光栅槽形至关重要。对于槽深在2～5nm的极浅槽深矩形光栅,为确保光栅槽形不发生变化,必须选择合适的多层膜周期数。按照这一原则制备的多层膜矩形光栅,在14.65nm处-1级衍射效率实测结果为22.1%,超过了国内外同类实验结果的最高报道值。Diffraction efficiency is critical for EUV multilayer gratings.To realize high diffraction efficiency,appropriate multilayer deposition method should be developed for grating substrates to ensure their groove shapes.The evolvement of groove shapes for laminar gratings during the deposition process was investigated.The results showed that the period number of the coating was a critical factor.To conserve groove shapes,period number should be selected appropriately for ultra shallow laminar gratings with depth of 2～5 nm.In the guideline of this principle,multilayer laminar grating with a diffraction efficiency of 22.1% at 14.65 nm on the-1 order was achieved,which exceeded all other results reported to date.

关 键 词：极紫外 多层膜光栅 光栅槽形 

分 类 号：O484.4[理学—固体物理]