高损伤阈值三倍频分离膜  

Third harmonic separator with high laser-induced damage threshold

作　　者：王孝东[1,2] 张锦龙[1,2] 马彬[1,2,3] 焦宏飞[1,2,3] 丁涛[1,2] 程鑫彬[1,2] 

机构地区：[1]同济大学精密光学工程技术研究所,上海200092 [2]上海市特殊人工微结构材料与技术重点实验室,上海200092 [3]同济大学航空航天与力学学院,上海200092

出　　处：《强激光与粒子束》2011年第7期1882-1884,共3页High Power Laser and Particle Beams

基　　金：国家高技术发展计划项目;中国博士后科学基金项目(20100470733);上海市博士后基金项目(10R21416000;10R21416600)

摘　　要：设计了Nd:YAG激光用三倍频分离膜,膜层材料为SiO2和HfO2。经过优化,膜系在355 nm处的反射率在99%以上,在532 nm和1 064 nm处透射率也在99%以上。采用电子束蒸发技术,在熔融石英基底上制备了样品,经测量,制备的分离膜光学性能与设计值接近。分离膜在355 nm激光辐照下的损伤阈值为5.1 J/cm2,并用微分干涉显微镜表征了薄膜损伤形貌。Using electron beam evaporation,a 355 nm separator was designed by depositiing SiO2 and HfO2 alternatively.The coating has a reflectivity of larger than 99% at 355 nm through optimization and a transmittance larger than 99% at 532 nm and 1 064 nm.It has good electric-field distribution.The spectra of the fabricated coating is close to the designed one.The laser-induced damage threshold of the coating is 5.1 J/cm2.Morphology of laser-induced damage of the coating was characterized by differential interference contrast microscope.

关 键 词：三倍频分离膜 电子束蒸发 激光损伤阈值 光学薄膜 

分 类 号：O484.4[理学—固体物理]