羟基磷灰石眼座置入后暴露的临床分析及处理  

Clinical analysis and treatment of hydroxyapatite artificial eye pedestal exposure after orbit implantation

作　　者：林菁[1] 包欣[1] 朱靖[1] 

机构地区：[1]无锡市人民医院眼科,江苏无锡214023

出　　处：《中国美容医学》2011年第9期1336-1337,共2页Chinese Journal of Aesthetic Medicine

摘　　要：目的:探讨分析羟基磷灰石眼座(hydr oxyapat i t e,HA)置入后暴露的原因及处理。方法:对18例羟基磷灰石眼座(HA)置入后暴露的患者,用不同的方法进行治疗和回顾性总结分析。结果:眼座暴露多发生在7～30天,暴露范围在1～15mm,其中3例自行愈合,15例进行手术治疗。结论:义眼座暴露为HA义眼座置入术后较为严重的并发症,根据暴露范围大小,可采用不同方法处理,暴露范围为中度(>5mm)以上时,应尽早手术。ObjectiveTo analyze the causes and treatment of HA artificial eye pedestal exposure after implantation.MethodsEighteen cases of HA orbital implant exposure were studied. Different treatment methods were applied, and their results are reviewed and analyzed.ResultsOrbital implant exposures occurred typically 7 to 30 days after implantation. The diameters of the exposures ranged from 1 to 15mm.Three of the cases studied were treated conservatively, and the conjunctional dehiscence healed spontaneously,fifteen other cases were managed by operation.ConclusionThe exposure of HA artificial eye pedestal is a serious syndrome after implantation. Depending on the size of the exposure,several treatment methods may be applied. Medium- and large-sized exposure （〉5mm） should be operated as early as possible.

关 键 词：义眼座 暴露 治疗 

分 类 号：R779.64[医药卫生—眼科]