基于厚金属狭缝阵列的表面等离子激元光刻  

Surface Plasmon Polaritions Lithography Based on Thick Metallic Slit Arrays

作　　者：肖啸[1] 肖志刚[1] 许德富[1] 邓迟[1] 刘晓云[2] 

机构地区：[1]乐山师范学院物理与电子工程学院,四川乐山614004 [2]四川大学物理科学与技术学院纳光子技术研究所,成都610064

出　　处：《光子学报》2011年第9期1381-1385,共5页Acta Photonica Sinica

基　　金：乐山师范学院科研项目资助

摘　　要：提出一种利用厚金属狭缝阵列耦合激发表面等离子激元制作非周期图形的纳米光刻模型.采用时域有限差分电磁场模拟仿真软件研究了厚金属狭缝阵列中表面等离子激元的激发、模式选择以及光刻胶中的光场分布.结果表明,通过优化厚金属狭缝阵列结构参量和匹配介质参量可有效抑制表面等离子激元在光栅狭缝出口处的发散,增加表面等离子激元的穿透深度,可获得高分辨率的较大曝光深度的周期和非周期纳米图形,可为纳米激光直写技术提供有益的借鉴.A surface plasmon polaritons lithography model was presented based on thick metallic slit arrays to fabricate aperiodic nanostructures. The excitation of surface plasmon polaritons, model selection in thick metallic slit arrays and the intensity distribution in photoresist were studied carefully with finite difference time-domain method. The results show that the diffusion of surface plasmon polaritons on slits can be inhibited, and the exposure depth is enhanced by optimizing the slits structure and matching medium lay. So periodic and aperiodic nanostructures are able to be produced by this technology. This may be helpful to fabricating nanostructures by laser direct writing technology.

关 键 词：光刻 厚金属狭缝 时域有限差分法 表面等离子激元 

分 类 号：O439[机械工程—光学工程] TN305.7[理学—光学]