用磁控溅射法制备纳米膜防辐射布的工艺探讨  

Research of Preparing Nano-membranes Anti-radiation Cloth by Magnetron Sputtering

作　　者：叶毓辉[1] 杨志敏[1] 何玉兰[1] 

机构地区：[1]深圳市计量质量检测研究院,广东深圳518139

出　　处：《纺织科技进展》2011年第5期20-23,共4页Progress in Textile Science & Technology

摘　　要：利用磁控溅射技术在涤纶无纺布表面沉积纳米结构银薄膜,以制得防辐射布。探讨了靶基距、溅射功率、工作气压和进气量等工艺条件对薄膜屏蔽效能的影响。结果表明在时间规定条件下,对屏蔽效能影响大小的排序是:工作气压>靶基距>进气量>溅射功率。The nano structure silver membranes were deposited on the surface of polyester nonwoven by magnetron sputtering technology to prepare the anti-radiation cloth.Then it discassed the effects of the target-based distance,sputtering power,work pressure,air capacity for the effectiveness of anti-radiation cloth.The results showed that under the condition of prescribed time,the sort in size of the effects from the factors for the effectiveness of anti-radiation cloth was： work pressure,target-based distance,air capacity,sputtering power.

关 键 词：磁控溅射 纳米膜 防辐射布 工艺 

分 类 号：TS195.6[轻工技术与工程—纺织化学与染整工程]