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作 者:公伟伟[1,2] 徐松梅[1,2] 吴明健[1,2] 高朋召[1,2]
机构地区:[1]湖南大学材料科学与工程学院,长沙410082 [2]湘潭大学低维材料及其应用技术教育部重点实验室,湘潭411105
出 处:《机械工程材料》2011年第10期36-40,共5页Materials For Mechanical Engineering
基 金:湘潭大学低维材料及其应用技术教育部重点实验室开放课题资助项目(DWKF0805)
摘 要:采用溶胶-凝胶法制备了Ag+、Zn2+共掺杂的TiO2纳米薄膜,研究了温度对Ag-Zn-TiO2体系稳定性的影响;采用XPS、SEM、XRD和抗菌性测试等方法研究了热处理温度对薄膜表面化学组成、微观结构、晶粒尺寸及抗菌性能的影响。结果表明:掺杂薄膜均匀致密,表面存在的白色点状团簇物为Ag2O,粒径约10nm;而Zn2+取代Ti4+进入TiO2晶格中;掺杂离子能阻抑TiO2晶粒的生长;掺杂薄膜在紫外线照射下抗菌率为100%,无光照时为99.5%,均显著优于未掺杂薄膜的;随热处理温度的升高,薄膜的抗菌活性先增加后降低,最佳热处理温度为500℃。Sol-gel method was used to prepare the Ag+, Zn2+ co-doped TiO2 thin film. Influence of temperature on stability of the Ag-Zn-TiO2 system was studied. XPS, SEM, XRD and antibacterial tests were used to investigated the effect of heat treatment temperature on the chemical composition, microstructure, grain size and antibacterial property of the obtained film. The results show that the doped film was uniform and dense. The white point existed on film surface was Ag20 and the size was about 10 nm, while the Zn2+ took place the Ti4+ into TiO2 lattice. Doped ions could inhibite grain growth of TiO2. The doped film exhibited antibacterial rate of 100% when UV light existed, the value was 99.5% when no light, both of the data were significantly better than that of the non-doped film. With increasing the heat treatment temperature, the antibacterial activity of film increased first and then decreased, the best heat treatment temperature was 500℃.
分 类 号:TG146.1[一般工业技术—材料科学与工程]
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