Mo/Si软X射线多层膜中厚度均匀性的精细控制  

Precise Control of Thickness Uniformity in Mo/Si Soft X-Ray Multilayer

作　　者：朱亚丹[1] 方明[1] 易葵[1] 

机构地区：[1]中国科学院上海光学精密机械研究所,上海201800

出　　处：《光学学报》2011年第11期297-301,共5页Acta Optica Sinica

摘　　要：为了获得光学性质均匀的大面积软X射线多层膜,必须控制好周期结构中单层膜的厚度均匀性。为此建立了磁控溅射薄膜沉积技术中单层膜厚度均匀性的分析和控制模型,解释了基底变速转动法可用来获得膜厚均匀的多层膜,并根据理论分析获得了基底的变速路径。将其应用于基底公转速度变速法来制备均匀性可控的大面积Mo/Si软X射线多层膜。小角X射线衍射测试结果表明,采用优化后的变速路径制备的多层膜,样品不同位置的各级次衍射峰位都能很好吻合,说明多层膜的周期厚度基本一致。计算表明该方法在直径200mm范围内可将周期结构中Mo层的不均匀性从20.6%修正到1.1%,Si层的不均匀性从27.0%修正到1.6%。To fabricate large area soft X-ray multilayer with uniform optical properties, the thickness uniformity of single layer in a period structure must be well controlled. The method of single layer thickness uniformity analysis and control in magnetron sputtering system is established, and variable speed rotation of sample holder to realize the uniformity of large area soft Xiray multilayer is explained. Variable rotation curve is acquired by theoretical analysis. It is used in the variable speed rotation of sample holder to realize the uniformity of large area soft X-ray multilayer. The low angle X-ray diffraction （LAXRD） results reveal that LAXRD curves at different points of samples prepared by optimized variable speed rotation paths have nearly the same diffraction angles at the same diffraction order. This phenomenon proves that the multilayer thicknesses are nearly the same value, The calculation results indicate that the thickness non-uniformity of Mo layer can be controlled in 1.1% and Si layer can be controlled in 1.6 % on an area with 200 mm diameter.

关 键 词：薄膜 软X射线膜 厚度均匀性 变速转动法 磁控溅射 光学均匀性 

分 类 号：O484[理学—固体物理]