钬激光器用高反膜的制备及其工艺研究  

Preparation and Technical Study of High-Reflectance Mirrors for Holmium Laser System

作　　者：宋永香[1] 黄建兵[1] 于振坤[1] 齐红基[1] 

机构地区：[1]中国科学院上海光学精密机械研究所,上海201800

出　　处：《中国激光》2011年第11期220-223,共4页Chinese Journal of Lasers

摘　　要：采用红外石英作为基底材料,利用SiO2/ZrO2膜系制备2100nm波段钬激光器0°高反膜。提出一套完整的优化工艺,解决了薄膜的材料(膜料和基底)本身的水吸收,克服了薄膜表面光洁底差、散射吸收损耗大、容易破裂等问题,镀制出的薄膜在激光使用波长透射率小于0.1%,粗糙度小于1nm,并且具有长期稳定性好,可靠性高等特点。ZrO2/SiO2 multilayer mirrors at normal incidence are deposited on the infrared quartz substrates for the application of holmium laser. The deposition process is optimized to overcome the water intrinsic absorption, surface scattering loss, mechanical stress of thin film materials. The transmittance and the surface roughness of mirror is less than 0.1% at the wavelength of 2.1 μm and 1nm, respectively. The deposited mirrors show long-term stability and high reliability in the application of holmium-laser system.

关 键 词：薄膜 钬激光器 高反膜 优化 

分 类 号：O438.1[机械工程—光学工程] O484.41[理学—光学]