退火工艺对NiCr20合金溅射靶材微观组织结构的影响  

Effect of annealing process on microstructure of NiCr20 alloy sputtering target

作　　者：范亮[1] 王欣平[1] 江轩[1] 

机构地区：[1]北京有色金属研究总院有研亿金新材料股份有限公司,北京102200

出　　处：《金属热处理》2011年第11期81-83,共3页Heat Treatment of Metals

摘　　要：在较大冷轧变形量的情况下,研究了退火温度和退火时间对NiCr20溅射靶材再结晶晶粒大小和均匀性的影响,通过试验确定了该合金靶材900℃退火2 h得到的再结晶晶粒大小相对细小均匀,晶粒度约为68μm。在该优化的退火工艺制度下,将成品靶材坯料进行退火,取样用XRD分析其晶粒的取向,测试结果显示不同部位样品的晶粒取向分布几乎一致,说明该靶材的晶粒取向均匀。Effect of annealing process on grain size and it＇s uniformity in the case of relative large deformation was investigated and the preferable annealing process was determined.The grain size of the alloy annealed at 900 ℃ for 2 h is about 68 μm with good uniformity and the grain orientation is also uniformity in any part of the target tested by XRD.

关 键 词：NiCr20合金靶材 退火工艺 晶粒大小及均匀性 晶粒取向及均匀性 

分 类 号：TG156.21[金属学及工艺—热处理]