激光等离子体效应对硅表面损伤特征的影响  

The Influence of Laser Plasma Effects on the Characteristics of Silicon Surface Damage

作　　者：范卫星[1,2] 韩敬华[1] 李海波[3] 杨李茗[3] 冯国英[1] 高翔[1] 刘岩岩[1] 包凌东[1] 黄永忠[1] 

机构地区：[1]四川大学电子信息学院,四川成都610064 [2]奥普镀膜技术(广州)有限公司,广东广州510730 [3]成都精密光学工程研究中心,四川成都610041

出　　处：《光谱学与光谱分析》2011年第12期3185-3189,共5页Spectroscopy and Spectral Analysis

基　　金：国家自然科学基金重大项目(60890203);国家自然学基金委员会-中国工程物理研究院联合基金项目(10676023);四川大学青年教师科研启动基金项目(2009SCU11008)资助

摘　　要：硅材料作为光电探测器的基础材料,研究其在强激光辐照下的损伤问题在激光探测、国防领域很有意义。对高强度纳秒激光作用下硅表面的损伤形貌特征进行了研究,结果表明:激光等离子体的热效应及冲击波效应,使激光作用区域内的物质迅速向外飞溅,形成点坑,并在点坑周围形成辐射状冷却物;散射光与入射激光干涉产生形成周期性分布的热应力使得硅材料表面张力发生变化,冷却后会在坑底表面产生周期性结构;从激光等离子体的光谱中可以发现N,O和Si的特征光谱,在重复激光脉冲作用下会在硅表面上覆盖一层导致色变的SiOx和SiNx复合薄膜,是激光等离子体的喷射产物。Silicon is the basic material for electro-photonic detectors,so the studies of the laser induced damage of silicon are ofgreat significance in laser detecting and military applications.The damage characters of silicon under high intensity nanosecondlaser pulses were investigated in the present paper.The results show that laser plasma has thermal effect,shock effect and spec-tral radiation effect,etc.These comprehensive effects combined together determinate the damage characters.By thermal effectsand shock effects of laser plasma,the material is being melt,vaporized,ionized and pushed out at the laser irradiated area.Inthis way,the pit can be formed and the cooled ejected effluents are radially distributed.The silicon was melt at the bottom of thepit and the temperature was modulated by the intensity of the incident laser,which interfered with scattering laser simultaneous-ly.The periodic heat distribution generates the period stripes.N,O and Si characteristic spectrum in the laser plasma prove thatthe colored film is the mixture of SiOx∶SiNywhich were sprayed out from laser plasma under repetitive laser pulses.

关 键 词：激光等离子体 多晶硅 激光诱导损伤 周期性结构 

分 类 号：O539[理学—等离子体物理]