辉光放电处理聚四氟乙烯——Ⅲ.PTFE表面结构的XPS表征  

PLASMA TREATMENT OF POLYTETRAFLUOROETHYLENE Ⅲ.XPS CHARACTERIZATION OF THE TREATED SURFACE

作　　者：周茂堂[1] 王世才[1] 陈捷[1] 

机构地区：[1]中国科学院长春应用化学研究所,长春130022

出　　处：《应用化学》1990年第6期82-84,共3页Chinese Journal of Applied Chemistry

摘　　要：Yasuda等在用XPS研究离子体处理后的PTFE表面结构时,得到一个包络的C_1s峰。本文对此进行探讨。 PTFE膜先在蒸馏水中浸泡1小时,再用热异丙醇洗涤5分钟。The surface modification of polytetrafluoroethylene film by exposuring to argon plasmawas carried out and the structure of the surface was investigated by x-ray photoelectronspectroscopy (XPS). The broad, overlaping C_1s peak in XPS spectrum was considered to beformed from 284.6(CH), 286.6(CO), 287.9(C = O), 289.0(CF) and 292.3 eV(CF_2). It isfound that, along with oxygen, nitrogen was also introduced into the surface structure ofPTFE upon plasma treatment.

关 键 词：聚四氟乙烯 等离子体处理 表面结构 

分 类 号：O632.21[理学—高分子化学]