全反射X荧光分析技术研究  

A Study of the Total Reflection X Ray Fludrescence Technique

作　　者：田宇纮[1] 谭继廉[2] 郑素华[1] 王瑞光[1] 刘恺[1] 潘晓文 

机构地区：[1]烟台大学物理系,264005 [2]中国科学院近代物理所,兰州730000

出　　处：《核电子学与探测技术》1995年第5期265-269,共5页Nuclear Electronics & Detection Technology

基　　金：国家自然科学基金委员会

摘　　要：建立了全反射 X 荧光分析技术,采用了特殊的全反射系统。充分有效地利用初始射线。使在小柬流条件下。达到较高的探测灵敏度。对二次全反射系统的结构进行了研究。选取了合适的结构。对钼激发和铜激发全反射形成的条件和高能切割现象进行了研究。研究了不同石英材料做的样品托(二级反射器)的杂质含量和对测量的影响进行了测试分析。以钴和钇元素为样品分别对铜激发和钼激发条件下的最小探测限进行了测量。分别达到0.6×10^(-9)和2.2×10^(-9)(6和2pg)。在此基础上分析了水质样品、油类样品、矿样等不同性质样品,研究了不同样品的制备方法,本文给出了全反射条件的建立。样品的制备、测试、灵敏度测试等结果并对其进行了讨论。The total reflection X ray fluorescence (TXRF) technique in which a double total reflection system was utilized,has been developed.This system can effectively use the original X ray and can thereby obtain higher detection sensitivity under condition of small beam.The struction of the double total reflection system,the condition to form total reflection and the phenomena of high energy cut for excitation of Cu and Mo targets have been investigated.The impurity content of sample carriers made of different kinds of quartz material have been analyzed.The system detection sensitivity of 0.6×10^(-9) and 2.2×10^(-9) have been obtained for the excitation of Cu and Mo respectively,when Co and Y elements are used as samples.Based on what is men- tioned above,different kinds of sample such as water,fuel,mineral and so on have also been analysed.In this paper the set up of total reflection conditions,the preparation of thin film sample,the measurement de- tails and the analysis results have been described and the conclusion has been given.

关 键 词：全反射 高能切割 薄样技术 灵敏度 多元素分析 

分 类 号：TL81[核科学技术—核技术及应用]