金属镀层镀布量的X射线荧光测定  

Determination of Metal Plating Mass Thickness by X Ray Fluorescence Method

作　　者：谢东[1] 孟丽云 刘鸣 

机构地区：[1]河北师范大学物理系,石家庄050016 [2]河北衡水市电视大学分校,衡水053000

出　　处：《核电子学与探测技术》1995年第5期311-314,325,共5页Nuclear Electronics & Detection Technology

摘　　要：本文讨论了7辐射源激发 X 射线荧光法用于测定金属镀层镀布量的三种方法。给出了各自的计算方法和实验结果。并同其他实验手段做了比对。认为这是非破坏性测定镀布量小于几 mg/cm^2 的镀层的最准确方法。方法简单易行,主要靠物理计算。实验中只用两片纯金属片作比较即可。Three methods of determining metal plating mass thickness by X ray fluorescence method using gamma radiation source have been discussed in this paper,their calculation method and experiment results have been given.Authors contrast them with other determination means,and think that X ray fluorescence method is most accurate method of determining metal plating mass thickness less than several mg/cm^2 non-destructive- ly.X ray fluorescence methods are simple,easy and mainly depend on physical calculation.Only two small pieces of pure metal plate are used to compare in the experiment.

关 键 词：镀层 镀布量 X 射线荧光 

分 类 号：TL81[核科学技术—核技术及应用]