MOCVD Growth of Doped GaAs/AlGaAs Quantum Heterostructures  

作　　者：任红文 徐现刚 黄柏标 刘士文 蒋民华 

机构地区：[1]Institute of Crystal Materials, Shandong University. Jinan China 250100

出　　处：《Rare Metals》1993年第1期25-29,共5页稀有金属（英文版）

摘　　要：The influences of growth techniques of AP-MOCVD GaAs/AlGaAs silicon-doped multi-quantum wells (MQWs), heterostructure bipolar transistors (HBTs), double barrier resonant tunneling diodes(DBRTDs) on their structures and performances were studied. Continuously grown MQWs, that is, no growth interruption at the heterointerfaces, shown blue-shifted, narrower and stronger photoluminescence(PL) compared with interruptedly grown ones.TEM examination of the interrupted interfaces revealed a bright line corresponding to the compositional fluctuation and impurity adsorption, and indicated noncommutative structures of AlGaAs/GaAs and GaAs/AlGaAs interfaces. High performance HBTs and DBRTDs were obtained by continuously grown method while growth interruption caused performance degradation. It was concluded that growth interruption may cause accumulation of residua1 impurities in the ambient as well as compositional fluctuation while continuous growth at very low growth rates can overcome such problems.The influences of growth techniques of AP-MOCVD GaAs/AlGaAs silicon-doped multi-quantum wells (MQWs), heterostructure bipolar transistors (HBTs), double barrier resonant tunneling diodes(DBRTDs) on their structures and performances were studied. Continuously grown MQWs, that is, no growth interruption at the heterointerfaces, shown blue-shifted, narrower and stronger photoluminescence(PL) compared with interruptedly grown ones.TEM examination of the interrupted interfaces revealed a bright line corresponding to the compositional fluctuation and impurity adsorption, and indicated noncommutative structures of AlGaAs/GaAs and GaAs/AlGaAs interfaces. High performance HBTs and DBRTDs were obtained by continuously grown method while growth interruption caused performance degradation. It was concluded that growth interruption may cause accumulation of residua1 impurities in the ambient as well as compositional fluctuation while continuous growth at very low growth rates can overcome such problems.

关 键 词：MOCVD Interrupted growth GaAs / AlGaAs Hetero-interface 

分 类 号：TG146.4[一般工业技术—材料科学与工程]