无毒性非氧化物添加剂的Si_3N_4陶瓷的显微组织  

Microstructure of Si_3N_4 with Non-Toxic, Non-Oxide Additives

作　　者：袁逸[1] 葛昌纯[2] 陈利民[2] 冯惠平[1] 

机构地区：[1]北京科技大学材料科学与工程系 [2]北京科技大学特种陶瓷粉末冶金研究室

出　　处：《北京科技大学学报》1991年第S2期70-74,共5页Journal of University of Science and Technology Beijing

摘　　要：采用ZrN作为添加剂热压烧结的Si_3N_4陶瓷材材料进行了透射电子显微镜观察和能谱EDS分析。观察结果表明:烧结的陶瓷中由于晶界残留的玻璃相数量较少,主要分布在三晶粒间界处,从而显著改善了Si_3N_4材料的高温性能;在这种材料中有许多弥散分布的ZrN相存在,可阻碍裂纹扩展,也起着提高Si_3N_4材料的强度和韧性的作用;用高分辨电子显微术观察到α’-Si_3N_4晶粒中存在不同的超结构。The microstructure of Si3N4 with non-toxic, non-oxide additive consisting of ZrN and A1N was examined by TEM and EDS. Minor intergranular glassy phase is observed at few triple regions, but is not found in most of grain boundaries in this new Si3N4-based ceramics. The superior HT properties are attributed to the significantly reduced amount of intergranular glassy phase and increase of its softening temperature. Many ZrN particles dispersed in matrix and secondary crystalline phase distributed in triple regions of grain boundaries are observed. Superior mechanical properties are closely related to the micro-structure features. In addition, different superstructures in α'-Si3N4 are found by lattice imaging.

关 键 词：氮化硅 显微结构 晶界 

分 类 号：N55[自然科学总论]