颗粒可控分散技术在CeO_2抛光粉生产中的应用研究  

Application of Particle Controllable Dispersion Technology on CeO_2 Polishing Powder Production

作　　者：王奇[1] 杨敏[2] 陈运法[3] 

机构地区：[1]国家纳米科学中心,北京100190 [2]北京科技大学化学与生物工程学院,北京100083 [3]中国科学院过程工程研究所,北京100190

出　　处：《中国稀土学报》2011年第6期724-729,共6页Journal of the Chinese Society of Rare Earths

基　　金：国家自然科学基金青年科学基金(51002037)

摘　　要：通过高能湿法球磨与低温喷雾干燥联用技术对传统沉淀法氧化铈抛光粉后处理工艺进行改进,从而实现生产过程中颗粒的可控分散。通过XRD确定产品晶型,采用SEM,BET和激光粒度仪对改进前后颗粒度变化进行了分析。将该产品与进口产品在ZF7和K9玻片抛光生产线上比较使用,良品率高于进口产品。结果表明该颗粒可控分散技术有效降低了颗粒的团聚程度,提高了颗粒均匀性,改善了抛光性能。The high-energy wet milling and low temperature spray drying method was developed to optimize the post processing of the ceria polishing powder production with traditional precipitation method. The particle controllable dispersion in the manufacturing process was realized. The XRD was used to confirm crystal form of the products. The changes of the granularity through post processing improvement were analyzed with SEM, BET and laser Darticle analyzer.Both the self-prepared and the imported abrasives were used comparatively in the polishing production line of ZF7 and K9 glasses. The rate of the self-prepared finished products was higher than that of the imported. According to the results of industrial application, it was proved that the particle controllable dispersion technology decreased the degree of particles aggregation and increased the particles uniformity effectively, then polishing performance was improved obviously.

关 键 词：可控分散 高能球磨 喷雾干燥 氧化铈 

分 类 号：TB302.3[一般工业技术—材料科学与工程]