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出 处:《硅酸盐学报》2011年第12期1898-1903,共6页Journal of The Chinese Ceramic Society
基 金:国家自然科学基金(10474078)资助项目
摘 要:以三氯化铝和叠氮化钠为原料,用复分解反应制备单晶氮化铝(AlN)纳米线。样品呈灰白色粉末,反应温度为650℃,反应时间为3h,并对该样品进行X射线衍射、透射电镜和选区电子衍射测试分析。结果表明:样品为六方相氮化铝且为表面光滑的长直形圆柱状,直径为50 nm左右,长度均在10μm以上,晶格常数分别为a=0.268nm、c=0.498nm。AlN样品性能的研究表明:样品禁带宽度约为6.14eV,并对光致发光谱中各峰的形成原因进行分析。采用气-固生长机理和择优取向原理对单晶纳米线的生长进行解释。Single-crystal AlN nanowires were prepared via double decomposition reaction, in which AlCl 3 and NaN 3 were used as raw materials. Samples were grayish white powder with reaction temperature of 650 ℃ and reaction time of 3 h. The AlN nanomaterials were tested by X-ray diffraction, transmission electron microscopy, and selected area electron diffraction. It is indicated that the samples are hexagonal AlN nanowires of long straight cylinders with a smooth surface about 50 nm in diameter and more than 10 μm in length, and its lattice constants are a=0.268 nm, c=0.498 nm. Performance test of the as-prepared samples shows that band-gap is 6.14 eV. The formation cause of each peak of photoluminescence spectra is explained. The growth of nanowires is interpreted by vapor-solid growth mechanism and preferred orientation principle.
关 键 词:氮化铝纳米线 复分解反应 气-固机理 光学性能 择优取向
分 类 号:TB34[一般工业技术—材料科学与工程]
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