含碘鎓盐光产酸剂和增感染料的化学增幅型i-线正性光致抗蚀剂  

Chemically Amplified Positive i-Line Photoresist Containing Iodonium Salt PAG and Dye Sensitizers

作　　者：刘娟[1] 孔繁荣[1] 余金星[1] 王力元[1] 

机构地区：[1]北京师范大学化学学院,北京100875

出　　处：《影像科学与光化学》2011年第6期430-437,共8页Imaging Science and Photochemistry

基　　金：国家自然科学基金(50773006)

摘　　要：4,4′-二甲苯基三氟甲磺酸碘鎓盐可以被染料增感,在365nm光照时分解产酸.尽管产生的酸与染料的胺基发生作用,依然能在后烘过程中催化缩醛聚合物酸敏基团的分解,但需要稍高的后烘温度和稍长的后烘时间.基于此,本文将酚醛树脂、缩醛聚合物、碘鎓盐产酸剂和染料组成了一种新型的化学增幅型i-线正性光致抗蚀剂材料,在曝光量为100mJ/cm2时可得到分辨率为0.8μm的清晰图形.染料与鎓盐光产酸剂组成的感光体系具有很好的漂白性,改善了抗蚀剂材料的透明性.The photolysis of Bis（4-methylphenyl） iodonium triflate can be sensitized by dyes to undergo at around 365 nm and give rise to photoacid.Although the photoacid was combined by the dialkylamino group of the dye,it still can catalyze the decomposition of the chain of acetal polymer at postexposure bake（PEB） process.Comparatively,a little higher temperature and longer time are favorable to the process.So,a new type of chemically amplified positive i-line photoresist can be formed by phenolic resin,acetal polymer,iodonium salt PAG and dye sensitizer.Clear pattern with resolution of 0.8 μm was obtained in the lithographic experiment of the photoresist with the exposure dose of 100 mJ/cm2.The bleachability of the combination of the PAG and dye will help to improve the transparency of the resist materials.

关 键 词：敏化剂 产酸剂 染料 正型 i-线抗蚀剂 酸解 缩醛聚合物 

分 类 号：TQ571[化学工程—精细化工]