射频磁控溅射制备HfLaO薄膜结构和光学性能研究  

Structural and Optical Properties of HfLaO Films Prepared by RF Magnetron Sputtering

作　　者：李智[1] 苗春雨[2] 马春雨[2] 张庆瑜[2] 

机构地区：[1]大连大学机械工程学院,大连116622 [2]大连理工大学物理与光电工程学院,大连116023

出　　处：《无机材料学报》2011年第12期1281-1286,共6页Journal of Inorganic Materials

基　　金：辽宁省教育厅高校科研计划项目(2008049);国家自然科学基金(10605009;10774018);中央高校基本科研业务专项基金(DUT11LK44)~~

摘　　要：采用射频磁控溅射技术制备HfLaO薄膜,利用X射线衍射（XRD）分析了薄膜的微结构,通过紫外可见光分光光度计测量了薄膜的透过谱,计算了薄膜的折射率和禁带宽度,利用原子力显微镜观察了薄膜的表面形貌.结果表明：沉积态HfLaO（La：25%～37%）薄膜均为非晶态,随着La掺入量的增加,HfLaO薄膜的结晶化温度逐渐升高,HfLaO（La～37%）薄膜经900℃高温退火后仍为非晶态,具有优良的热稳定性,AFM形貌分析显示非晶薄膜表面非常平整.随着La掺入量的增加,HfLaO薄膜的透射率先降后增,在可见光范围薄膜均保持较高的透射率（82%以上）.HfLaO薄膜的折射率为1.77~1.87.随着La掺入量的增加,HfLaO薄膜的折射率呈先增后降的变化趋势,同时HfLaO薄膜的Eg逐渐降低,分别为5.9eV（La～17%）、5.87eV（La～25%）、5.8eV（La～33%）和5.77eV（La～37%）.HfLaO films doped with different La contents,varying from 17% to 37%,were deposited using RF magnetron sputtering.The structure,thermal stability,surface morphology,and optical properties of HfLaO films were investigated by X-ray diffraction（XRD）,atomic force microscope（AFM） and spectrophotometry.The results indicate that as-deposited HfLaO with 25% 37% La films are amorphous.With the increase of La contents,the crystallization temperature for HfLaO films is increased.The HfLaO film with 37% La remains amorphous even after annealed at 900℃.The AFM images show amorphous HfLaO films,which imply a good thermal stability have a relatively smooth surface.The average transmittance in the visible range is above 82% for all the films.The amorphous structure yields films of significantly higher transparency than the polycrystalline structure does.The refractive indices of the films are determined to be in the range 1.77 1.87.As the La concent increases the refractive indices of the films are initially increased and then decreased.The optical band gap of the HfLaO films decreases to 5.9eV（La 17%）,5.87eV（La 25%）,5.8eV（La 33%）,5.77eV（La 37%）,respectively.

关 键 词：HfLaO薄膜 磁控溅射 热学稳定性 光学性能 

分 类 号：O484[理学—固体物理] TN386[理学—物理]