金刚石膜中的黑色层状缺陷及非相关成因  

Formation analysis and the black lamellar defects on diamond films

作　　者：罗廷礼[1] 

机构地区：[1]河北省科学院激光研究所,河北石家庄050081

出　　处：《河北省科学院学报》2011年第4期10-15,共6页Journal of The Hebei Academy of Sciences

摘　　要：对高功率直流电弧等离子体喷射法制备的金刚石膜中的黑色层状缺陷进行了研究。沉积过程中通过改变沉积速率;适量加氧、加水、加氮;采用高纯气体;调整漏气率;多台设备并联运行;单台设备反复运行和交换零部件多种手段,均未找到其成因。中对用黑厚时位式新理念的研究作了报导。证实夹层成因和膜制备过程中的上述因素间无密切关系。The black lamellar defects are investigated, which was in diamond films and were prepared with DC Arc Plasma Jet CVD method. The cause of black lamellar defects were not found by various kinds of methods, such as changing deposition rate, adding proper amount of oxygen, water and nitrogen ,adopting pure gases, adjusting gas leakage rate, parallel operation of multiple equipments, re peated operation of single equipment and exchanging parts. The black lamellar defects were found to be closely related with film formation process by using black thickness time sequence formulation. A new concept of black thickness time sequence formulation was reported in this paper.

关 键 词：金刚石膜 黑色层状缺陷 黑度-厚度-时位式 

分 类 号：TB383[一般工业技术—材料科学与工程] O77[理学—晶体学]